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Updated: Jun 8, 2026

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition
Published on: August 29, 2017
Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-A)
Abstract:
Practical issues in the development of multilayer coatings for reflective imaging systems operating at λ ≈ 68 Å are discussed. The 1% bandpass of Ru/B(4) C multilayers at this short wavelength imposes stringent tolerances with which the actual multilayer period variation across the curved surfaces must match the ideal period variation for a 20× demagnifying Schwarzschild objective. New deposition techniques that use masks to correct the period variation across the curved surfaces of each optic have been developed to ensure reflectance over the entire clear aperture. The narrow bandpass together with steep lateralperiod gradients and steeply curved surfaces requires improved metrology for an acceptable period variation to be obtained and the overlap of the reflectance peaks on the two mirrors to be verified.

