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Updated: Jun 6, 2026

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Picometer-Precision Atomic Position Tracking through Electron Microscopy
Published on: July 3, 2021
Real-time scanning charged-particle microscope image composition with correction of drift
Petr Cizmar1, András E Vladár, Michael T Postek
1National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA.
Summary
A new scanning electron microscopy (SEM) technique corrects image distortions caused by sample drift. This method aligns and combines multiple rapid frames to produce clear, accurate images for metrology applications.
Area of Science:
- Materials Science
- Microscopy Technology
Background:
- Scanning electron microscopy (SEM) is crucial for high-resolution imaging.
- Drift distortion in SEM images causes blur and deformation, hindering metrology.
- Conventional slow and fast scan methods are susceptible to significant drift corruption.
Purpose of the Study:
- To introduce a novel SEM image composition technique.
- To significantly reduce drift-related image corruptions in SEM.
- To enable high-accuracy metrology applications requiring sub-nanometer precision.
Main Methods:
- Acquiring a large number of quick frames.
- Properly aligning these frames.
- Composing aligned frames into a single, corrected image.
Main Results:
- Minimized blur and deformation in the final composite image.
- Reduced noise compared to individual frames.
- Obtained data on sample position changes over time.
Conclusions:
- The new technique effectively corrects SEM image drift.
- The method enhances image quality for critical metrology tasks.
- It offers a tool for investigating instrument drift properties without extra equipment.
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