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Design and Characterization of X-Ray Multilayer Analyzers for the 50-1000 eV Region.

B L Henke¹, E M Gullikson, J Kerner

¹Center for X-Ray Optics, Accelerator and Fusion Research Division, Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, California 94720.

Journal of X-Ray Science and Technology

|February 11, 2011

Summary

This summary is machine-generated.

This study details over a decade of developing multilayer analyzers for precise low-energy X-ray spectrometry. These advanced multilayer optics enable accurate characterization of intense X-ray sources like synchrotrons.

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Area of Science:

X-ray optics and instrumentation
Materials science for layered structures
Spectrometry and spectroscopy

Background:

Multilayer analyzers are crucial for characterizing novel intense X-ray sources.
Previous applications primarily focused on diagnostics and analysis.
A need existed for precise, absolute measurements in the low-energy X-ray range.

Purpose of the Study:

To present a decade of development and application of multilayer analyzers for absolute Bragg spectrometry.
To establish design requirements for accurate low-energy X-ray spectrometry.
To develop and validate analytical models for multilayer reflectivity.

Main Methods:

Characterization of multilayer reflectivity using semiempirical methods.
Development and application of modified Darwin-Prins models for reflectivity analysis.
Utilizing a specialized spectrograph for absolute reflectivity measurements.
Implementation of computer programs for spectral analysis.

Main Results:

Detailed reflectivity characterizations for mica, potassium acid phthalate, Langmuir-Blodgett, and sputtered multilayers.
Derived analytical models accurately predict multilayer reflectivity and diffraction suppression.
Demonstrated the dependence of reflectivity on model parameters and interface structure.
Developed software for transforming measured spectra to absolute spectra.

Conclusions:

Multilayer analyzers are effective tools for absolute Bragg spectrometry in the 50-1000 eV range.
The developed analytical models and measurement procedures enable accurate X-ray source characterization.
This work provides a foundation for advanced applications in X-ray diagnostics and analysis.