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Updated: Jun 3, 2026
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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
Published on: December 16, 2011
Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates
Changdeuck Bae1, Hyunchul Kim, Hyunjung Shin
1Institute of Applied Physics, University of Hamburg, Jungiusstr. 11, 20355 Hamburg, Germany.
Chemical Communications (Cambridge, England)
|March 23, 2011
Abstract:
We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO(2)/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs.
