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Atomic ordering and structural determination of AlGaN/AlN/Si(111) thin films using anomalous X-ray scattering

Hyun Hwi Lee1, Hyo Jung Kim

  • 1Pohang Accelerator Laboratory, Pohang, Kyungbuk 790-784, Korea.

Journal of Nanoscience and Nanotechnology
|April 2, 2011
PubMed

Keywords:
Anomalous X-ray scatteringAlGaN thin filmsX-ray diffractionAtomic orderingSemiconductor materials

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