Infrared suppression by hybrid EUV multilayer--IR etalon structures

V V Medvedev1, A E Yakshin, R W E van de Kruijs

  • 1FOM Institute for Plasma Physics, Nieuwegein, The Netherlands. medvedev@rijnhuizen.nl

Optics Letters
|September 3, 2011
PubMed
Summary

A new multilayer mirror effectively reflects extreme ultraviolet (EUV) radiation while nearly eliminating infrared (IR) light. This innovation enhances monochromatic imaging, including EUV photolithography, by suppressing unwanted spectral components.

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