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Reduced distribution of threshold voltage shift in double layer NiSi2 nanocrystals for nano-floating gate memory

Sungjin Choi1, Junhyuk Lee, Donghyoun Kim

  • 1Department of Nanoscale Semiconductor Engineering, Hanyang University, 17 Haengdangdong, Seongdonggu, Seoul 133-791, Korea.

Journal of Nanoscience and Nanotechnology
|March 14, 2012
PubMed

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