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Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors
V V Medvedev1, A E Yakshin, R W E van de Kruijs
1FOM Institute DIFFER, Nieuwegein, The Netherlands.
Abstract:
An extreme ultraviolet multilayer mirror with an integrated spectral filter for the IR range is presented and experimentally evaluated. The system consists of an IR-transparent B4C/Si multilayer stack which is used both as EUV-reflective coating and as a phase shift layer of the resonant IR antireflective (AR) coating. The AR coating is optimized in our particular case to suppress CO2 laser radiation at a wavelength of 10.6 μm, and a suppression of more than two orders of magnitude is demonstrated. The method allows high suppression over a large angular acceptance range, relevant for application in lithography systems.
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