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On-chip optical interconnects made with gallium nitride nanowires
Matt D Brubaker1, Paul T Blanchard, John B Schlager
1Physical Measurement Laboratory, National Institute of Standards and Technology, Boulder, Colorado 80305, USA. matthew.brubaker@nist.gov
Nano Letters
|January 18, 2013
Summary
Researchers developed a two-nanowire device using gallium nitride (GaN) nanowires for light emission and detection. This GaN nanowire technology offers potential for integrated optical interconnects on electronic systems.
Area of Science:
- Materials Science and Engineering
- Nanotechnology
- Optoelectronics
Background:
- Gallium nitride (GaN) nanowires are promising for optoelectronic applications due to their unique properties.
- Integrating light-emitting and detecting functionalities at the nanoscale is crucial for advanced electronic systems.
Purpose of the Study:
- To fabricate and characterize a two-nanowire device utilizing GaN nanowires.
- To investigate the optical coupling capabilities of the fabricated GaN nanowire device.
- To explore the potential for on-chip optical interconnects using GaN nanowires.
Main Methods:
- Growth of axial p-n junction GaN nanowires via molecular beam epitaxy.
- Transfer of GaN nanowires to a non-native substrate.
- Selective electrical contacting to create discrete optical source/detector components.
Main Results:
- Successful fabrication of a two-nanowire device comprising GaN nanowires.
- Demonstration of both light-emitting and photoconductive capabilities within the GaN nanowires.
- Characterization of the optical coupling efficiency of the nanowire device.
Conclusions:
- The developed GaN nanowire device integrates light emission and detection functionalities.
- The demonstrated optical coupling opens possibilities for novel optoelectronic integration.
- This technology could enable new pathways for optical interconnects between on-chip electrical subsystems.
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