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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Ryo Ishikawa1, Naoya Shibata, Fumiyasu Oba
1Institute of Engineering Innovation, University of Tokyo, 2-11-16, Yayoi, Bunkyo, Tokyo 113-8656, Japan.
Cubic boron nitride doped with cerium (Ce3+) ions reveals unique inclusion mechanisms. These dopants occupy nitrogen sites, not boron sites, and are associated with boron vacancies, crucial for optoelectronic applications.
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