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Published on: December 7, 2017
Droplet dynamics in controlled InAs nanowire interconnections
Dan Dalacu1, Alicia Kam, D Guy Austing
1National Research Council of Canada, Ottawa, Canada, K1A 0R6. dan.dalacu@nrc-cnrc.gc.ca
Nano Letters
|May 3, 2013
Summary
Researchers achieved precise positioning of indium arsenide (InAs) nanowires using selective-area vapor-liquid-solid epitaxy. This control enables the fabrication of interconnected nanowire devices and offers insights into catalyst droplet dynamics during growth.
Area of Science:
- Materials Science
- Nanotechnology
- Semiconductor Physics
Background:
- Semiconductor nanowires are crucial for advanced nanoelectronic and nanophotonic devices.
- Precise control over nanowire placement is essential for device integration and functionality.
Purpose of the Study:
- To demonstrate unprecedented control over the position of indium arsenide (InAs) nanowires.
- To enable the fabrication of interconnected nanowire structures through controlled catalyst particle coalescence.
- To investigate droplet dynamics during vapor-liquid-solid (VLS) growth.
Main Methods:
- Utilizing selective-area vapor-liquid-solid (VLS) epitaxy.
- Employing an indium phosphide (InP) ridge template for guided growth.
- Analyzing postgrowth structures using imaging techniques.
Main Results:
- Achieved high-level control over InAs nanowire positioning.
- Successfully fabricated structures with interconnected nanowires via catalyst particle coalescence.
- Observed complex and previously uncharacterized droplet configurations during VLS growth.
Conclusions:
- Selective-area VLS epitaxy provides exceptional control for nanowire placement.
- The controlled interconnection of nanowires is feasible, paving the way for complex device architectures.
- The study advances the understanding of catalyst droplet behavior in VLS nanowire growth.

