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Updated: May 10, 2026
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Published on: March 31, 2016
Nanopillar array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system
Chen Zhang1, Kaige Wang, Jintao Bai
1Institute of Photonics and Photo-technology, International Scientific and Technological Cooperation Base of Photoelectric Technology and Functional Materials and Application, Northwest University, 229 North Taibai Rd, Xi'an, 710069, People's Republic of China. wangkg@nwu.edu.cn.
Abstract:
Nanoscale functional structures are indispensable elements in many fields of modern science. In this paper, nanopillar array with a pillar diameter far smaller than Abbe's diffraction limit is realized by a new kind of continuous wave (CW) laser direct lithography technology. With atomic force microscopy technology, the average diameter of nanopillars on thin OIR906 photoresist film is about 65 nm and the smallest diameter is 48 nm, which is about 1/11 of the incident laser wavelength. Also, the influences of coma and astigmatism effects to the shape and size of nanopillar are numerically simulated by utilizing vector integral. As far as we know, it is the first time that nanopillar array is implemented by a donut-shaped 532-nm visible CW laser. The study presents a new, simple, inexpensive, and effective approach for nanopillar/pore array fabrication.
