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Updated: Mar 27, 2026

Probing C84-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics
Published on: September 28, 2016
Valence band offset at the Si/SiSn interface by applying deep level transient spectroscopy
Victor-Tapio Rangel-Kuoppa1, Alexander Tonkikh, Nikolay Zakharov
1Institute of Semiconductor- and Solid State Physics, Johannes Kepler Universität, A-4040 Linz, Austria.
Hole activation energies in silicon-tin quantum wells increase with tin fraction. Valence band offsets were determined for pseudomorphic and unstrained Si1-x Sn x /Si heterojunctions.
Area of Science:
- Materials Science
- Semiconductor Physics
- Quantum Engineering
Background:
- Silicon-tin (Si1-x Sn x) alloys are promising for optoelectronic applications.
- Quantum wells (QWs) enable precise control of electronic properties.
Purpose of the Study:
- To investigate the activation energies of holes in Si1-x Sn x /Si(001) quantum wells.
- To determine the valence band offsets in these heterostructures.
Main Methods:
- Molecular beam epitaxy (MBE) for growing Si1-x Sn x /Si(001) quantum wells.
- Deep-level transient spectroscopy (DLTS) for measuring hole activation energies.
Main Results:
- Hole activation energies increase monotonically with increasing tin (Sn) fraction (x).
- Valence band offset for pseudomorphic Si1-x Sn x /Si follows ΔE(v) = 1.69x eV.
- Valence band offset for unstrained Si1-x Sn x /Si follows ΔE(v(av)) = 1.27x eV.
Conclusions:
- The Sn fraction is a critical parameter influencing hole behavior in Si1-x Sn x /Si QWs.
- Quantified valence band offsets provide essential data for designing Si1-x Sn x based devices.
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