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Updated: Mar 17, 2026

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Tunneling Characteristics Depending on Schottky Barriers and Diffusion Current in SiOC
Aluminum-doped zinc oxide (AZO) films on silicon oxycarbide (SiOC) substrates exhibit high mobility and ambipolar characteristics. This is due to tunneling effects and diffusion currents, enhanced by a well-matched interface and high Schottky Barrier.
Area of Science:
- Materials Science
- Semiconductor Physics
- Thin Film Technology
Background:
- Silicon oxycarbide (SiOC) is a material with potential applications in semiconductor devices.
- Understanding the interface properties between SiOC and other thin films is crucial for device performance.
Purpose of the Study:
- To investigate the deposition of aluminum-doped zinc oxide (AZO) films on SiOC/Si wafers.
- To analyze the impact of SiOC substrate characteristics on AZO film growth and properties.
- To understand the mechanisms responsible for diffusion current and ambipolar characteristics in AZO/SiOC heterostructures.
Main Methods:
- Radio Frequency (RF) magnetron sputtering was used to deposit AZO films on SiOC/Si wafers.
- X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) were employed to analyze film structure and composition.
- Electrical properties, including carrier concentration, mobility, and ambipolar characteristics, were measured.
Main Results:
- SiOC films exhibited amorphous phases.
- The growth of AZO films was influenced by SiOC characteristics, showing similar XPS trends and increased lattice d-spacing.
- Defect-induced trapped charges at the AZO/SiOC interface reduced carrier mobility.
- AZO films grown on SiOC with low charge carrier concentration and high mobility (e.g., at O2 = 25 or 30 sccm) displayed high mobility and ambipolar characteristics.
- Structural matching at the interface enhanced the Schottky Barrier (SB) height, increasing mobility via band-to-band tunneling.
Conclusions:
- The interface properties between AZO and amorphous SiOC significantly influence carrier transport.
- Optimized AZO/SiOC interfaces can lead to enhanced mobility and ambipolar behavior in oxide semiconductors.
- Tunneling effects and diffusion currents are key mechanisms for achieving high performance in these heterostructures.
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