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CMOS-Compatible Fabrication for Photonic Crystal-Based Nanofluidic Structure
Wang Peng1,2,3,4, Youping Chen1, Wu Ai1
1School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, China.
Nanoscale Research Letters
|February 18, 2017
Summary
This study introduces novel nanofluidic structures using photonic crystals (PCs) compatible with semiconductor manufacturing. Optimized PC designs confine enhanced electric fields within nanochannels for high-performance applications.
Area of Science:
- Nanotechnology
- Photonics
- Fluidics
Background:
- Photonic crystals (PCs) are established in optics but new to nanofluidics.
- Complementary metal-oxide-semiconductor (CMOS) compatible fabrication is key for integration.
Purpose of the Study:
- To develop a novel nanofluidic structure using CMOS-compatible photonic crystals.
- To confine enhanced electric fields within nanochannels for advanced applications.
Main Methods:
- Fabricated a nanofluidic prototype using CMOS-compatible techniques.
- Utilized direct bonding of polydimethylsiloxane (PDMS) to seal channels on PC gratings.
- Employed silicon nitride (Si3N4) as a guided mode layer and silicon dioxide (SiO2) as a substrate on a silicon wafer.
Main Results:
- Achieved high-fidelity periodic gratings with a fill factor of 0.5.
- Optimized the photonic crystal structure to confine enhanced electric fields within the nanochannel.
- Selected higher-order mode resonance wavelengths for field confinement.
Conclusions:
- Successfully fabricated a PC-based nanofluidic structure using CMOS-compatible methods.
- Demonstrated effective confinement of enhanced electric fields within nanochannels.
- The developed structure shows potential for high-performance PC-based nanofluidic applications.
