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Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption
Dédalo Sanz-Hernández1, Amalio Fernández-Pacheco1
1Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom.
Beilstein Journal of Nanotechnology
|December 22, 2017
Abstract:
[This corrects the article DOI: 10.3762/bjnano.8.214.].
Keywords:
3D nanoprintingBET modelLangmuir modeladsorption isotherm theorycontinuum modelfocused electron beam induced depositionMore Related Videos
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