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Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

Dédalo Sanz-Hernández1, Amalio Fernández-Pacheco1

  • 1Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom.

Beilstein Journal of Nanotechnology
|December 22, 2017
PubMed

Abstract:

[This corrects the article DOI: 10.3762/bjnano.8.214.].

Keywords:
3D nanoprintingBET modelLangmuir modeladsorption isotherm theorycontinuum modelfocused electron beam induced deposition

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