Improved contacts to p-type MoS₂ transistors by charge-transfer doping and contact engineering

MoS₂ is known to show stubborn n-type behavior due to its intrinsic band structure and Fermi level pinning. Here, we investigate the combined effects of molecular doping and contact engineering on the transport and contact properties of monolayer (ML) MoS₂ devices. Significant p-type (hole-transport) behavior was only observed for chemically doped MoS₂ devices with high work function palladium (Pd) contacts, while MoS₂ devices with low work function metal contacts made from titanium showed ambipolar behavior with electron transport favored even after prolonged p-doping treatment. ML MoS₂ transistors with Pd contacts exhibit effective hole mobilities of (2.3 ± 0.7) cm² V^-1 S^-1 and an on/off ratio exceeding 10⁶. We also show that p-doping can help to improve electrical contacts in p-type field-effect transistors: relatively low contact resistances of (482 ± 40) kΩ microm and a Schottky barrier height of ≈156 meV were obtained for ML MoS₂ transistors. To demonstrate the potential application of 2D-based complementary electronic devices, a MoS₂ inverter based on pristine (n-type) and p-doped monolayer MoS₂ was fabricated. This work presents a simple and effective route for contact engineering, which enables the exploration and development of high-efficiency 2D-based semiconductor devices.