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Published on: January 19, 2018
Analysis of Current Variation with Work Function Variation in L-Shaped Tunnel-Field Effect Transistor
Jang Hyun Kim1, Hyun Woo Kim2, Young Suh Song2,3
1School of Electrical Engineering, Pukyong National University, Busan 48513, Korea.
This study analyzes L-shaped tunnel field-effect transistors (TFETs) using TCAD simulations. Gate work function variation impacts on-state current, hump current, and ambipolar current differently, offering insights for device optimization.
Area of Science:
- Semiconductor Device Physics
- Nanoelectronics
- Materials Science
Background:
- L-shaped tunnel field-effect transistors (TFETs) are explored for advanced electronic applications.
- Gate work function variation (WFV) is a critical parameter influencing TFET performance.
- Understanding TFET behavior under WFV is essential for device design.
Purpose of the Study:
- To investigate the impact of gate work function variation (WFV) on L-shaped TFET characteristics.
- To analyze the distinct behaviors of on-state current (I_ON), hump current (I_HUMP), and ambipolar current (I_AMB) under WFV.
- To elucidate the relationship between WFV, tunneling region size, and band-to-band tunneling (BTBT) rates.
Main Methods:
- Technology Computer-Aided Design (TCAD) simulations were employed for device analysis.
- Systematic variation of gate work function was performed.
- Band-to-band tunneling (BTBT) rates were analyzed across different device regions.
Main Results:
- On-state current (I_ON) variation is sensitive to tunneling region size and can be reduced by increasing it.
- Hump current (I_HUMP) and ambipolar current (I_AMB) variations show less dependence on tunneling region size.
- BTBT rate analysis revealed that I_ON is influenced by WFV across the entire gate, while I_HUMP and I_AMB are primarily affected at the gate edge.
Conclusions:
- WFV has a significant but differentiated impact on various current components in L-shaped TFETs.
- The spatial dependence of BTBT rate on WFV explains the observed current variations.
- These findings provide crucial guidance for optimizing L-shaped TFET design through gate engineering.
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