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Tunable Microwave Filters Using HfO2-Based Ferroelectrics.

Martino Aldrigo1, Mircea Dragoman1, Sergiu Iordanescu1

  • 1National Institute for Research and Development in Microtechnologies (IMT Bucharest), Erou Iancu Nicolae Street 126A, 077190 Voluntari, Ilfov, Romania.

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Summary
This summary is machine-generated.

Tunable microwave filters using hafnium zirconate (HfZrO) ferroelectric thin films were developed. These filters demonstrate continuous tuning across targeted frequency bands with applied DC voltage, showing potential for advanced microwave applications.

Keywords:
ferroelectric materialhafnium oxidemicrowavestunable filter

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Area of Science:

  • Materials Science
  • Electrical Engineering
  • Nanotechnology

Background:

  • Ferroelectric materials offer tunable dielectric properties crucial for microwave devices.
  • Hafnium oxide (HfO2) based ferroelectrics are promising due to their CMOS compatibility.
  • Stabilizing ferroelectric phases at room temperature is essential for practical applications.

Purpose of the Study:

  • To develop tunable microwave filters utilizing novel ferroelectric thin films.
  • To investigate the performance of hafnium zirconate (HfZrO) for tunable microwave applications.
  • To demonstrate the feasibility of Atomic Layer Deposition (ALD) for fabricating high-quality ferroelectric films for filters.

Main Methods:

  • Fabrication of 6-nm-thick HfZrO ferroelectric thin films using Atomic Layer Deposition (ALD).
  • Characterization of film properties including polarization-voltage (P-V) response and surface topography.
  • Design, modeling, fabrication, and microwave characterization of low-pass, high-pass, and band-pass filters.

Main Results:

  • HfZrO films exhibited stable orthorhombic polar phase at room temperature.
  • Tunable frequency response observed for filters with applied DC voltage (0-4 V).
  • Filters showed frequency shifts between 90 MHz and 4.4 GHz, with insertion loss as low as 6.9 dB.

Conclusions:

  • 6-nm HfZrO ferroelectric thin films enable continuous tuning of microwave filters.
  • ALD process provides uniform films with low roughness, suitable for microwave devices.
  • The developed filters demonstrate significant frequency tuning capabilities for microwave applications.