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Phase leading active disturbance rejection control for a nanopositioning stage
Wei Wei1, Zhiyuan Zhang2, Min Zuo3
1Beijing Technology and Business University, Beijing 100048, China; Beijing University of Posts and Telecommunications, Beijing 100876, China.
This study introduces phase-leading active disturbance rejection control (PLADRC) to improve piezoelectric nanopositioning accuracy. PLADRC enhances disturbance estimation and compensation, outperforming standard methods.
Area of Science:
- Control Engineering
- Nanotechnology
- Mechatronics
Background:
- Piezoelectric nanopositioning systems suffer from reduced accuracy due to hysteresis.
- Existing inverse hysteresis models struggle with uncertainties and disturbances.
- Linear active disturbance rejection control (LADRC) shows promise but is limited by phase lag in disturbance estimation.
Purpose of the Study:
- To develop an enhanced active disturbance rejection control strategy for piezoelectric nanopositioning.
- To improve the estimation and compensation of total disturbances in the presence of hysteresis.
- To achieve superior positioning accuracy and dynamic performance.
Main Methods:
- A phase-leading extended state observer (PLESO) was designed by integrating a phase-leading network into a linear extended state observer.
- The PLESO's advantages in estimating time-varying total disturbances were analyzed.
- Phase-leading active disturbance rejection control (PLADRC) was implemented using the PLESO.
Main Results:
- The PLESO demonstrated improved estimation of time-varying total disturbances.
- PLADRC compensated for total disturbances more effectively than LADRC.
- Experimental results confirmed PLADRC's superiority in dynamic responses and disturbance rejection.
Conclusions:
- The developed PLESO offers an effective, nonlinearity-free method to enhance active disturbance rejection control (ADRC).
- PLADRC significantly improves positioning accuracy in piezoelectric systems by mitigating hysteresis effects.
- The proposed approach provides a practical solution for precise nanopositioning applications.
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