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Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
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High-Resolution Lithographic Patterning with Organotin Films: Role of CO2 in Differential Dissolution Rates.

Nizan Kenane1, Douglas A Keszler1

  • 1Department of Chemistry, Oregon State University, Corvallis, Oregon 97331, United States.

ACS Applied Materials & Interfaces
|April 13, 2021
PubMed
Summary
This summary is machine-generated.

Researchers studied organotin photoresists for nanoscale patterning. They found that carbon dioxide absorption significantly impacts the dissolution contrast, improving patterning performance and reducing variability in advanced semiconductor manufacturing.

Keywords:
electron-beam lithographyextreme ultraviolet lithographyinorganic resistorganotin clusters

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemistry

Background:

  • Organotin compounds are crucial in advanced photolithography for achieving high-resolution patterning.
  • Understanding the chemical mechanisms behind photoresist behavior is essential for optimizing semiconductor manufacturing processes.

Purpose of the Study:

  • To investigate the role of atmospheric gases in the dissolution behavior of an n-butyltin oxide hydroxide photoresist.
  • To elucidate the chemical processes influencing patterning performance at the single-digit-nanometer scale.

Main Methods:

  • Cryo scanning tunneling electron microscopy (cryo-STEM) for imaging latent images.
  • Temperature-programmed desorption mass spectrometry (TPD-MS) to analyze gas desorption and absorption.
  • Cryo electron energy loss spectroscopy (cryo-EELS) to study film composition changes.

Main Results:

  • Irradiated photoresist films showed carbon depletion due to butane and butene desorption.
  • A previously unrecognized absorption of carbon dioxide (CO2) in irradiated films was identified.
  • CO2 absorption correlated with enhanced dissolution contrast, improving patterning fidelity.

Conclusions:

  • Atmospheric gases, particularly CO2, play a critical role in the patterning performance of organotin photoresists.
  • The absorption of CO2 influences the differential dissolution rates, impacting resolution and variability.
  • Controlling atmospheric composition during processing is vital for consistent, high-performance nanoscale patterning.