Quantitative amplitude-modulation scanning Kelvin probe microscopy via the second eigenmode excitation
Junqi Lai1, Cheng Wang2, Zhiwei Xing3
1School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China; i-Lab, CAS Center for Excellence in Nanoscience, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China.
Improving contact potential difference (CPD) measurements using amplitude modulation scanning Kelvin probe microscopy (AM-SKPM) is crucial. This study enhances AM-SKPM accuracy by exciting the probe at its second eigenmode, significantly reducing crosstalk for more reliable surface potential analysis.
Area of Science:
- Surface Science
- Microscopy Techniques
- Materials Characterization
Background:
- Amplitude modulation scanning Kelvin probe microscopy (AM-SKPM) is a standard technique for measuring contact potential difference (CPD).
- Quantitative accuracy of AM-SKPM is often limited by crosstalk between the probe's cantilever and the sample surface.
Purpose of the Study:
- To significantly improve the quantitative accuracy of CPD measurements obtained via AM-SKPM.
- To demonstrate a novel method for reducing crosstalk artifacts in AM-SKPM.
Main Methods:
- Utilizing the second eigenmode of oscillation for exciting the SKPM probe.
- Analyzing the effect of the second eigenmode's stationary node on cantilever displacement and virtual work.
- Experimental validation using interdigitated electrodes and semiconductor heterojunctions (GaAs/GaN).
Main Results:
- Exciting the SKPM probe at its second eigenmode drastically improves the accuracy of CPD measurements.
- This method effectively reduces the crosstalk effect by partially canceling the virtual work done by the cantilever.
- Experimental results confirm enhanced accuracy on both calibration samples and practical material interfaces.
Conclusions:
- Driving the SKPM probe at its second eigenmode offers a robust solution to the crosstalk limitation in AM-SKPM.
- This technique provides more reliable and quantitatively accurate CPD measurements for surface potential analysis.
- The improved AM-SKPM method is applicable to various material systems, including semiconductor heterojunctions.
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