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High-efficiency diffraction gratings for EUV and soft x-rays using spin-on-carbon underlayers.

Xiaolong Wang1, Dimitrios Kazazis1, Li-Ting Tseng1

  • 1Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, 5232 Villigen, Switzerland.

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|October 22, 2021
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Summary

We developed high-resolution gratings for extreme ultraviolet (EUV) and soft X-ray applications using a novel spin-on-carbon (SOC) underlayer. This technique enables fabrication of nanostructures with improved diffraction efficiency for advanced lithography and spectroscopy.

Keywords:
EUVdiffraction gratingsdiffractive opticsinterference lithographysoft x-raysspin-on-carbon

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Area of Science:

  • Nanofabrication
  • Optics and Photonics
  • Materials Science

Background:

  • Fabricating high-resolution gratings for EUV and soft X-ray applications is challenging due to pattern collapse in thin films.
  • Existing methods often limit the achievable aspect ratio and diffraction efficiency.

Purpose of the Study:

  • To develop and characterize high-resolution gratings with enhanced diffraction efficiency for EUV and soft X-ray applications.
  • To demonstrate the effectiveness of a spin-on-carbon (SOC) underlayer in overcoming pattern collapse limitations.

Main Methods:

  • Fabrication of diffraction gratings down to 20 nm half-pitch (HP) using a bilayer of hydrogen silsesquioxane (HSQ) and SOC on Si3N4 membranes.
  • Rigorous coupled-wave analysis (RCWA) for theoretical diffraction efficiency calculation.
  • Experimental measurement of diffraction efficiency using dose-to-clear curves.
  • Application of gratings as masks in extreme ultraviolet interference lithography (EUV-IL).

Main Results:

  • Successfully fabricated gratings down to 20 nm HP with improved high aspect ratio nanostructures.
  • Bilayer gratings exhibited significantly higher diffraction efficiency compared to HSQ-only gratings, confirmed by RCWA.
  • Experimental measurements of diffraction efficiency agreed well with theoretical predictions.
  • Demonstrated printing of 10 nm HP line/space patterns using EUV-IL with the developed grating masks.

Conclusions:

  • The HSQ/SOC bilayer approach effectively enables the fabrication of high-resolution, high-aspect-ratio nanostructures for EUV and soft X-ray applications.
  • The enhanced diffraction efficiency of these gratings is beneficial for interference lithography, Fresnel zone plates, and spectroscopy.
  • This method offers a pathway to improved performance in advanced nanophotonic devices.