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In-situ Near-Field Probe Microscopy of Plasma Processing.

Alexander Tselev1, Jeffrey Fagan2, Andrei Kolmakov2

  • 1CICECO and Department of Physics, University of Aveiro, 3810-193 Aveiro, Portugal.

Applied Physics Letters
|January 13, 2022
PubMed
Summary

Scanning near-field microwave microscopy offers nanoscale surface characterization during plasma treatments. This technique enables monitoring of thin film transformations with submicron resolution, overcoming limitations of current methods.

Keywords:
Scanning probe microscopycarbon nanotubesin situmicrowave impedance microscopyplasma processing

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Area of Science:

  • Materials Science
  • Surface Science
  • Nanotechnology

Background:

  • * Current in situ nanoscale surface and thin film characterization during plasma treatments is limited.
  • * Existing methods include 'post mortem' microscopy or in situ optical techniques lacking nanoscale resolution.

Purpose of the Study:

  • * To introduce scanning near-field microwave microscopy (SNMM) for nanoscale monitoring of plasma-assisted processes.
  • * To demonstrate SNMM's capability for submicron spatial resolution in plasma environments.

Main Methods:

  • * Developed an SNMM approach using a SiN membrane to isolate the plasma environment from the probe.
  • * Imaged transformations of carbon nanotube films during plasma-induced oxidation.

Main Results:

  • * Successfully monitored gradual transformations of carbon nanotube films.
  • * Achieved submicron spatial resolution for plasma-assisted process characterization.
  • * Demonstrated the feasibility of imaging through a thin SiN membrane.

Conclusions:

  • * SNMM provides a viable method for nanoscale in situ characterization during plasma treatments.
  • * The technique allows monitoring of material changes, such as plasma-induced oxidation.
  • * Further development is needed for real-time imaging during active plasma conditions.