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Updated: Sep 29, 2025

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
Deep-Learning-Assisted Focused Ion Beam Nanofabrication
Oleksandr Buchnev1, James A Grant-Jacob1, Robert W Eason1
1Optoelectronics Research Centre, University of Southampton, Highfield, Southampton SO17 1BJ, United Kingdom.
Abstract:
Focused ion beam (FIB) milling is an important rapid prototyping tool for micro- and nanofabrication and device and materials characterization. It allows for the manufacturing of arbitrary structures in a wide variety of materials, but establishing the process parameters for a given task is a multidimensional optimization challenge, usually addressed through time-consuming, iterative trial-and-error. Here, we show that deep learning from prior experience of manufacturing can predict the postfabrication appearance of structures manufactured by focused ion beam (FIB) milling with >96% accuracy over a range of ion beam parameters, taking account of instrument- and target-specific artifacts. With predictions taking only a few milliseconds, the methodology may be deployed in near real time to expedite optimization and improve reproducibility in FIB processing.
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