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Updated: Sep 23, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Self-powered, high response and fast response speed metal-insulator-semiconductor structured photodetector based on
Xinxin Liu1, Feng Li1, Minxuan Xu1
1State Key Laboratory for Advanced Metals and Materials, School of Materials Science and Engineering, University of Science and Technology Beijing Beijing 100083 People's Republic of China junjieqi@ustb.edu.cn.
Abstract:
Here, we firstly fabricated a metal-insulator-semiconductor (MIS) (Pd/Al2O3/MoS2) self-powered photodetector based on MoS2, which is sensitive to the illumination of light without any external bias, exhibiting a high responsivity of 308 mA W-1. Under bias, it shows a ratio of photocurrent to dark current exceeding 3705, a high photoresponsivity of 5.04 A W-1, and a fast response/recovery time of 468 ms/543 ms. The optoelectronic performances of the photodetector are closely related to the insulating layer, which can suppress the dark current of the photodetectors, and prevent strong current drifting and degradation by environmental effects, playing a key role in carrier tunneling. Furthermore, we used a thin HfO2 film as the insulating layer to improve the optoelectronics performance of the MIS structured self-powered photodetector, which presented a high responsivity of 538 mA W-1 at 0 bias. With an applied bias, it exhibits an on/off ratio up to 6653, a photoresponsivity of 25.46 A W-1, and a response/recovery time of 7.53 ms/159 ms. Our results lead to a new way for future application of high performance MIS structured photodetectors based on 2D MoS2.
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