High frequency characterization of Si N dielectrics for artificial magnetoelectric devices

Jaianth Vijayakumar1, Marcos Gaspar2, Laura Maurel3,4

  • 1Swiss Light Source, Paul Scherrer Institute (PSI), 5232 Villigen PSI, Switzerland.

Journal of Materials Science
|November 18, 2022
PubMed
Summary

Stoichiometric silicon nitride membranes show promise for high-frequency magnetoelectric devices by minimizing defects. This research explores defect impacts on dielectric properties for improved device performance.

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