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A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
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Abridging CMOS Technology
1Department of Electrical Engineering, City University of Hong Kong, Hong Kong, China.
Nanomaterials (Basel, Switzerland)
|December 11, 2022
Abstract:
Whether from a device physics, fabrication technology, or process economics point of view, the practice of downsizing silicon-based CMOS devices will soon end [...].
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