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Related Concept Videos

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Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
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Absolute wavelength scanning interferometry for measuring the thickness of optical elements.

Pavel Psota, Jan Kredba, Marek Stašík

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    This study introduces a novel technique for measuring optical element thickness using absolute wavelength scanning interferometry. The method achieves high accuracy for both flat and curved components, offering a versatile solution for optical metrology.

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    Area of Science:

    • Optical Engineering
    • Metrology
    • Interferometry

    Background:

    • Accurate thickness measurement of optical components is critical for high-grade systems.
    • Existing methods may lack versatility or precision for both planar and non-planar elements.

    Purpose of the Study:

    • To present a new technique for precise optical element thickness measurement.
    • To demonstrate the method's applicability to both flat and curved optical surfaces.

    Main Methods:

    • Utilizes absolute wavelength scanning interferometry based on a Fizeau interferometer.
    • Integrates data from three tunable laser diodes for an extended effective wavelength range.
    • Employs areal interferometric data and high angle sensitivity for alignment and error reduction.

    Main Results:

    • Achieves measurement uncertainty from hundreds of nanometers to a few microns for central thickness.
    • Successfully measures thickness of flat optical elements and lenses with curved surfaces.
    • Provides additional data such as wedge and surface form error for flat samples.

    Conclusions:

    • The developed technique offers high accuracy and versatility for optical thickness metrology.
    • It can replace multiple single-purpose measurement devices, enhancing efficiency.
    • The method's adaptability allows for measurement of other essential optical parameters.