Field Effect Transistor
MOSFET: Enhancement Mode
Switching of BJT
Biasing of FET
MOSFET: Depletion Mode
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Updated: Aug 8, 2025

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Chanwoo Kang1, Haeju Choi1, Hyeonje Son1
1SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University (SSKU), Suwon 16419, Korea. leesj@skku.edu.
Researchers developed a new impact-ionization transistor using MoS2 and WSe2. This device achieves steep switching at room temperature, overcoming limitations of current electronics for energy-efficient computing.
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