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    Area of Science:

    • Optoelectronics
    • Semiconductor Devices
    • Integrated Photonics

    Background:

    • Germanium-on-silicon (Ge-on-Si) avalanche photodiodes (APDs) are crucial for optical sensing.
    • Complementary metal-oxide semiconductor (CMOS) compatibility is essential for scalable photonic integrated circuits.

    Purpose of the Study:

    • To introduce a novel bridge-connected three-electrode Ge-on-Si APD array.
    • To investigate the performance enhancements offered by the third electrode for near-infrared (NIR) imaging.

    Main Methods:

    • Fabrication of a three-electrode Ge-on-Si APD array compatible with CMOS processes.
    • Electrical and optical characterization of a single three-electrode APD.
    • Analysis of the impact of Ge electrode voltage on dark current and responsivity.
    • Demonstration of NIR imaging capabilities using the APD array.

    Main Results:

    • A functional three-electrode Ge-on-Si APD array compatible with CMOS was successfully fabricated.
    • Applying a positive voltage to the Ge electrode significantly reduced dark current and increased light responsivity (0.6 A/W to 1.17 A/W at 100 nA dark current).
    • The array demonstrated effective near-infrared imaging properties.

    Conclusions:

    • The three-electrode Ge-on-Si APD design offers improved performance for optical sensing applications.
    • This technology is suitable for LiDAR imaging and low-light detection systems.
    • The CMOS compatibility facilitates integration into advanced optical systems.