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Updated: Jul 24, 2025

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
Published on: December 5, 2015
Mayur Chaudhary1,2,3,4,5, Yu-Chuan Shih1,3,4,5, Shin-Yi Tang1,3,4,5,6
1Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan.
Researchers engineered a novel 2D-layered WSe2/WO3 heterolayer for improved resistive switching devices. This phase and interfacial engineering enhances device uniformity, multilevel characteristics, and retention times for advanced electronics.
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