A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

Area of Science:

• Materials Science
• Nanotechnology
• Electrical Engineering

Background:

• Nanoscale resistance measurements are crucial for microelectronics, memory devices, molecular electronics, and 2D materials.
• Current conductive probe atomic force microscopy (C-AFM) measurements are largely qualitative due to a lack of calibration standards.
• Advancing nanoscale device research requires reliable and comparable resistance measurements.

Purpose of the Study:

• To develop a multi-resistance reference sample for calibrating C-AFM.
• To establish a protocol for in situ calibration of the entire C-AFM measurement circuit.
• To enable quantitative resistance measurements at the nanoscale.

Main Methods:

• Development of a multi-resistance reference sample spanning 100 Ω to 100 GΩ.
• Implementation of a comprehensive in situ calibration protocol for the C-AFM system (tip, sensor, controller).
• Validation of the reference sample's performance in calibrating C-AFM.

Main Results:

• The developed reference sample enables C-AFM calibration across a wide resistance range (100 Ω to 100 GΩ).
• Achieved combined relative uncertainty below 2.5% (10 kΩ to 100 GΩ) and below 1% (1 MΩ to 50 GΩ).
• Demonstrated the potential for highly accurate and reproducible nanoscale resistance measurements.

Conclusions:

• The novel reference sample overcomes the limitations of qualitative C-AFM measurements.
• Provides a universal solution for calibrated nanoscale resistance measurements in research and industry.
• Facilitates the transition of nanoscale device development from research to manufacturing.