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Related Concept Videos

Formation of Complex Ions03:45

Formation of Complex Ions

A type of Lewis acid-base chemistry involves the formation of a complex ion (or a coordination complex) comprising a central atom, typically a transition metal cation, surrounded by ions or molecules called ligands. These ligands can be neutral molecules like H2O or NH3, or ions such as CN− or OH−. Often, the ligands act as Lewis bases, donating a pair of electrons to the central atom. These types of Lewis acid-base reactions are examples of a broad subdiscipline called coordination...
Metal-Ligand Bonds02:51

Metal-Ligand Bonds

The hemoglobin in the blood, the chlorophyll in green plants, vitamin B-12, and the catalyst used in the manufacture of polyethylene all contain coordination compounds. Ions of the metals, especially the transition metals, are likely to form complexes.
In these complexes, transition metals form coordinate covalent bonds, a kind of Lewis acid-base interaction in which both of the electrons in the bond are contributed by a donor (Lewis base) to an electron acceptor (Lewis acid). The Lewis acid in...
Properties of Organometallic Compounds01:23

Properties of Organometallic Compounds

Organometallic compounds are compounds that contain a carbon–metal bond. Carbon belongs to an organyl group like alkyl, aryl, allyl, or benzyl groups. The metal can be from Group I or Group II of the periodic table, a transition metal, or a semimetal.
Colloidal precipitates01:09

Colloidal precipitates

The high insolubility of some precipitates can result in an unfavorable relative supersaturation. This can lead to colloidal particles with a large surface-to-mass ratio, where adsorption is promoted. For instance, in the precipitation of silver chloride, silver ions are adsorbed on the surface of the colloidal particles, forming a primary layer. This layer attracts ions of opposite charge (such as nitrate ions), forming a diffuse secondary layer of adsorbed ions. This electric double layer...
Extraction: Advanced Methods00:56

Extraction: Advanced Methods

Metal ions can be separated from one another by complexation with organic ligands–the chelating agent– to form uncharged chelates. Here, the chelating agent must contain hydrophobic groups and behave as a weak acid, losing a proton to bind with the metal. Since most organic ligands used in this process are insoluble or undergo oxidation in the aqueous phase, the chelating agent is initially added to the organic phase and extracted into the aqueous phase. The metal-ligand complex is formed in...
Complexation Equilibria: Factors Influencing Stability of Complexes01:09

Complexation Equilibria: Factors Influencing Stability of Complexes

In complexation reactions, metal cations are the electron pair acceptors, and the ligands are the electron pair donors. The stability of the metal complexes depends primarily on the complexing ability of the central metal ion and the nature of the ligands. Generally, the complexing ability of the metal ion depends on the size and charge of the ion. As the metal ion size increases, the stability of the metal complexes decreases, provided that the valency of the metal ion and the ligands remain...

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In Situ Synthesis of Gold Nanoparticles without Aggregation in the Interlayer Space of Layered Titanate Transparent Films
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Synthesis of Plasmonically Active Titanium Nitride Using a Metallic Alloy Buffer Layer Strategy.

Arthur F Lipinski1, Christopher W Lambert1, Achyut Maity1

  • 1School of Mathematics and Physics, Queen's University Belfast, Belfast BT7 1NN, U.K.

ACS Applied Electronic Materials
|January 1, 2024
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Titanium nitride (TiN) thin films offer a promising alternative for plasmonics. A CrRu buffer layer enables high-quality TiN on cost-effective substrates, achieving excellent plasmonic performance.

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Area of Science:

  • Materials Science
  • Nanotechnology
  • Optics

Background:

  • Traditional plasmonic materials face limitations.
  • Titanium nitride (TiN) is an emerging alternative with tunable properties.
  • Developing high-quality TiN films on diverse substrates is crucial for advanced applications.

Purpose of the Study:

  • To investigate the use of a chromium-ruthenium (CrRu) buffer layer for fabricating high-quality TiN thin films.
  • To evaluate the plasmonic performance of TiN films on amorphous substrates.
  • To characterize TiN thin films and nanostructures for surface plasmonics.

Main Methods:

  • Fabrication of TiN thin films on fused silica using a CrRu buffer layer.
  • Characterization of film quality and plasmonic properties.
  • Utilizing attenuated total reflectance (ATR) and cathodoluminescence (CL) spectroscopy.

Main Results:

  • Achieved best-in-class TiN thin films with a plasmonic figure of merit (-ϵ'/ϵ″) of approximately 2.8.
  • Demonstrated high film quality on cost-effective fused silica substrates at a moderate temperature of ~300 °C.
  • Characterized TiN triangular nanostructures, showing potential for surface plasmonics.

Conclusions:

  • The CrRu buffer layer facilitates the deposition of high-quality TiN on amorphous substrates.
  • TiN thin films exhibit excellent plasmonic performance, rivaling traditional materials.
  • TiN nanostructures show promise for future surface plasmonic devices.