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Optical Characterization in Microelectronics Manufacturing
S Perkowitz1, D G Seiler1, W M Duncan2
1National Institute of Standards and Technology, Gaithersburg, MD 20899-0001.
Summary
Optical characterization techniques are vital for semiconductor manufacturing, offering nondestructive analysis of material properties and device performance. These methods provide detailed insights crucial for developing advanced semiconductor materials and devices.
Area of Science:
- Materials Science
- Solid State Physics
- Optoelectronics
Background:
- Semiconductor device fabrication requires precise measurement of material and device parameters.
- Characterization is essential for quality control, new material development, and understanding microstructures.
- Optical characterization offers non-destructive, minimal sample preparation, and wafer-scale mapping capabilities.
Purpose of the Study:
- To review key optical characterization techniques used in the semiconductor industry.
- To highlight the advantages of optical methods over electrical and chemical approaches.
- To demonstrate the application of these techniques for measuring diverse semiconductor properties.
Main Methods:
- Ellipsometry
- Infrared Spectroscopy
- Microscopy
- Modulation Spectroscopy
- Photoluminescence
- Raman Scattering
Main Results:
- Optical techniques measure fundamental parameters like band structure, carrier scattering, impurities, defects, and layer thicknesses.
- These methods are non-destructive, require minimal sample preparation, and enable 2D/3D property mapping.
- The selected techniques cover a broad spectrum of electromagnetic radiation and measure various semiconductor properties.
Conclusions:
- Optical characterization is indispensable for the semiconductor industry, supporting both research and production.
- The discussed techniques provide comprehensive insights into semiconductor materials and device performance.
- These non-destructive optical methods are crucial for advancing semiconductor technology.
