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Updated: Jun 29, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Multi-Stimuli Operando Transmission Electron Microscopy for Two-Terminal Oxide-Based Devices.
Oscar Recalde-Benitez1, Yevheniy Pivak2, Robert Winkler1
1Advanced Electron Microscopy Division, Institute of Materials Science, Department of Materials and Geosciences, Technische Universität Darmstadt, Peter-Grünber-strasse 2, Darmstadt 64287, Germany.
Microelectromechanical systems (MEMS) chips enable in situ transmission electron microscopy (TEM) studies of nanoelectronic devices. A novel technique reveals reoxidation decreases leakage current in memristors and capacitors after ion/electron bombardment.
Area of Science:
- Materials Science
- Nanoscience
- Electrical Engineering
Background:
- In situ transmission electron microscopy (TEM) with microelectromechanical systems (MEMS) chips offers advanced nanoelectronic device analysis.
- Controlling multiple stimuli within a TEM environment for device operation is a significant challenge.
Purpose of the Study:
- To investigate the impact of multi-stimuli application on the electrical performance of TEM lamella devices.
- To develop and validate a technique for approximating macroscale leakage current measurements in TEM lamellae.
Main Methods:
- Integration of MEMS-based chips with in situ TEM gas cells for biasing experiments.
- Development of a post-focused ion beam (FIB) healing technique for leakage current approximation.
- Exposure of SrTiO3-based memristors and BaSrTiO3-based tunable capacitors to ion and electron bombardment in oxygen-rich environments.
Main Results:
- A reoxidation process was observed in SrTiO3 and BaSrTiO3 devices.
- Ion and electron bombardment in oxygen-rich environments led to a decrease in leakage current.
- Successful demonstration of multi-stimuli TEM experiments on metal-insulator-metal devices.
Conclusions:
- The developed technique enables in situ electrical characterization of nanoelectronic devices under various stimuli.
- Reoxidation is a key factor influencing leakage current in these materials under specific bombardment conditions.
- This work paves the way for advanced multi-stimuli TEM studies of complex electronic devices.

