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Characterization of bubbler performance for low-volatility liquid precursor delivery.

James E Maslar1, William A Kimes1, Brent A Sperling1

  • 1Material Measurement Laboratory, National Institute of Standards and Technology 100 Bureau Drive, Gaithersburg, MD 20899, USA.

Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, and Films : an Official Journal of the American Vacuum Society
|July 10, 2024
PubMed
Summary

This study characterizes a bubbler for delivering cobalt precursors (CCTBA) in vapor deposition. A model accurately predicts precursor flow rates, crucial for optimizing chemical vapor deposition and atomic layer deposition processes.

Keywords:
(tBu-acetylene) dicobalthexacarbonylALDCCTBACVDNDIRatomic layer depositionbubblerchemical vapor depositionnon-dispersive infrared gas analyzerprecursor delivery

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Area of Science:

  • Materials Science
  • Chemical Engineering
  • Semiconductor Manufacturing

Background:

  • Low-volatility liquid precursors are essential for advanced deposition techniques.
  • Accurate delivery of these precursors is critical for process control and film quality.
  • Cobalt precursors like CCTBA are used in specialized semiconductor applications.

Purpose of the Study:

  • To characterize the performance of a bubbler system for delivering cobalt precursor (CCTBA).
  • To investigate the influence of process parameters (carrier gas flow rate, system pressure, bubbler temperature) on precursor delivery.
  • To develop and validate a model for predicting precursor flow rates.

Main Methods:

  • Experimental characterization of bubbler performance across a wide process window.
  • Measurement of CCTBA partial pressure using a custom non-dispersive infrared gas analyzer.
  • Development of a predictive model incorporating headspace partial pressure and pressure drop.

Main Results:

  • CCTBA flow rates were accurately measured and modeled under various conditions.
  • A model assuming constant partial pressure and including pressure drop showed good agreement with experimental data.
  • The temperature dependence of CCTBA partial pressure was successfully parameterized using the August equation.

Conclusions:

  • The bubbler system demonstrates reliable performance for delivering CCTBA.
  • The developed model provides a deeper understanding of factors influencing bubbler performance.
  • The findings are applicable to other low-volatility liquid precursors in vapor deposition processes.