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Transport in a Two-Channel Nanotransistor Device with Lateral Resonant Tunneling
Ulrich Wulf1, Amanda Teodora Preda2,3, George Alexandru Nemnes2,3
1Faculty 1, Brandenburg University of Technology Cottbus-Senftenberg, Platz der Deutschen Einheit 1, Konrad-Wachsmann-Allee 13, 03046 Cottbus, Germany.
We demonstrate novel nanotransistors using silicon/silicon dioxide that enable low-energy applications. These devices exhibit a persistent resonant tunneling peak at room temperature, crucial for efficient current switching.
Area of Science:
- Solid State Physics
- Quantum Electronics
- Nanotechnology
Background:
- Field effect nanotransistors (FETs) are crucial for modern electronics.
- Lateral resonant tunneling in nanostructures offers potential for low-power devices.
- Si/SiO2 material systems are widely used in semiconductor technology.
Purpose of the Study:
- To investigate lateral resonant tunneling in Si/SiO2 nanotransistors.
- To analyze quantum transport properties using the R-matrix approach.
- To explore the potential for low-energy electronic applications.
Main Methods:
- Development of a piecewise linear potential model.
- Application of the R-matrix method for quantum transport calculations.
- Comparison of analytical approximations with full numerical simulations.
Main Results:
- Observation of a narrow resonant tunneling peak near zero control voltage in transfer characteristics.
- Demonstration that the resonant tunneling peak persists at room temperature.
- Identification of efficient current switching with small control voltages.
Conclusions:
- Si/SiO2 nanotransistors based on lateral resonant tunneling are promising for low-energy electronics.
- The observed room-temperature persistence of the tunneling peak is a significant advantage over previous III-V systems.
- The R-matrix method provides a fundamental understanding of lateral tunneling transport in planar systems.
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