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Combining one and two photon polymerization for accelerated high performance (3 + 1)D photonic integration.
Adrià Grabulosa1, Johnny Moughames1, Xavier Porte1
1FEMTO-ST/Optics Department, UMR CNRS 6174, University Bourgogne Franche-Comté, 15B avenue des Montboucons, Besançon Cedex, 25030, France.
Nanophotonics (Berlin, Germany)
|December 5, 2024
Summary
Researchers developed a novel 3D printing method combining one and two-photon polymerization for faster fabrication of integrated photonic circuits. This technique significantly enhances optical confinement and reduces fabrication time for advanced electronic devices.
Area of Science:
- Optoelectronics and Photonics
- Materials Science and Engineering
- Additive Manufacturing
Background:
- High-performance electronic integration faces limitations due to 2D lithography and thermal dissipation challenges.
- Three-dimensional (3D) photonic integration is crucial for scalable, application-specific integrated circuits, particularly for neural networks.
- Direct laser writing, specifically two-photon polymerization (TPP), is a promising CMOS-compatible technique for high-resolution 3D photonic integration.
Purpose of the Study:
- To develop a novel, accelerated fabrication process for 3D photonic integration by combining one-photon polymerization (OPP) and TPP.
- To enhance optical confinement and reduce fabrication time for 3D photonic circuits.
- To demonstrate the performance and stability of waveguides fabricated using the new method.
Main Methods:
- Introduced a hybrid (3 + 1)D "flash"-TPP technique combining femtosecond TPP for waveguide cores and support structures with UV-initiated OPP for passive volumes.
- Optimized voxel spacing during TPP for smooth interfaces (cores) and rapid printing (supports).
- Utilized UV blanket irradiation for rapid polymerization of the entire chip's passive volume, decoupling fabrication time from volume size.
Main Results:
- Successfully fabricated vertical single-mode waveguides with lengths up to 6 mm and numerical apertures (NA) of 0.16.
- Achieved low injection losses (-0.26 dB) and propagation losses (-1.36 dB/mm at 660 nm), comparable to silicon photonics.
- Demonstrated long-term optical performance stability (>3000 h post-printing) and operational stability (600 h continuous use).
Conclusions:
- The combined OPP and TPP approach significantly accelerates 3D photonic circuit fabrication while improving optical confinement.
- The fabricated waveguides exhibit high performance metrics and excellent long-term stability, suitable for advanced photonic applications.
- This method offers a scalable and efficient pathway for realizing complex 3D integrated photonic devices for emerging technologies like neural networks.
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