Estimation of Dislocation Densities With Nondestructive Scanning Electron Microscope Techniques: Application to

Arka Mandal1, Benoît Beausir1, Julien Guyon1

  • 1Université de Lorraine, CNRS, Arts et Métiers, LEM3, Metz 57070, France.

Summary

Characterizing threading dislocations (TDs) in gallium nitride (GaN) is vital for semiconductor reliability. Combining electron channeling contrast imaging (ECCI) and high-resolution electron backscattered diffraction (HR-EBSD) effectively counts and characterizes TDs in GaN epitaxial layers.

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