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Estimation of Dislocation Densities With Nondestructive Scanning Electron Microscope Techniques: Application to
Arka Mandal1, Benoît Beausir1, Julien Guyon1
1Université de Lorraine, CNRS, Arts et Métiers, LEM3, Metz 57070, France.
Characterizing threading dislocations (TDs) in gallium nitride (GaN) is vital for semiconductor reliability. Combining electron channeling contrast imaging (ECCI) and high-resolution electron backscattered diffraction (HR-EBSD) effectively counts and characterizes TDs in GaN epitaxial layers.
Area of Science:
- Semiconductor Materials Science
- Materials Characterization
- Solid State Physics
Background:
- Threading dislocations (TDs) significantly impact gallium nitride (GaN) semiconductor device performance and reliability.
- Accurate characterization of TD densities and types is essential for optimizing GaN-based electronic and optoelectronic devices.
- Existing characterization methods may have limitations in comprehensively evaluating TDs.
Purpose of the Study:
- To comparatively evaluate the effectiveness of electron channeling contrast imaging (ECCI) and high-resolution electron backscattered diffraction (HR-EBSD) for characterizing threading dislocations (TDs) in GaN.
- To determine the performance of ECCI and HR-EBSD in assessing TD densities and types in GaN epitaxial layers.
- To establish a complementary approach for comprehensive TD analysis.
Main Methods:
- Utilized a scanning electron microscope (SEM) equipped with both ECCI and HR-EBSD.
- Performed comparative analysis of TD densities and types using ECCI for counting and HR-EBSD for crystallographic orientation and strain analysis.
- Investigated dislocation line vectors, types (edge, mixed, screw), and their distribution relative to the growth direction ([0001]).
Main Results:
- Dislocation line vectors predominantly deviate from the GaN growth direction ([0001]).
- Edge-type dislocations, with lines parallel to [0001], and mixed-type dislocations were identified within dislocation clusters.
- HR-EBSD, with a spatial resolution of 50 nm, could not resolve individual dislocations but provided insights into lattice rotations and residual elastic strain fields.
Conclusions:
- ECCI and HR-EBSD are complementary techniques for counting and characterizing TDs in GaN.
- Combining ECCI's counting capability with HR-EBSD's description of geometrically necessary dislocation density provides a comprehensive measure of total TD density and dislocation type proportions.
- While HR-EBSD has limitations in resolving individual TDs at the nanoscale, its analysis of strain and rotation complements ECCI for a thorough understanding of TD impact.
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