Related Experiment Video
Updated: Sep 18, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
Impact of Reset Pulse Width on Gradual Conductance Programming in Al2O3/TiOx-Based RRAM
Hyeonseong Lim1, Wonbo Shim2, Tae-Hyeon Kim1
1Department of Semiconductor Engineering, Seoul National University of Science and Technology, Seoul 01811, Republic of Korea.
Shortening the reset pulse width in multilevel resistive random access memory (RRAM) significantly improves programming linearity and reduces device variation. This optimization enables more reliable and precise multilevel operation in Al2O3/TiO x-based RRAM devices.
Area of Science:
- Materials Science
- Electrical Engineering
- Solid-State Physics
Background:
- Resistive random access memory (RRAM) offers high-density non-volatile memory solutions.
- Multilevel conductance programming is crucial for increasing RRAM storage capacity.
- Controlling filament formation and rupture is key to reliable RRAM operation.
Purpose of the Study:
- To investigate the effect of reset pulse width on multilevel conductance programming in Al2O3/TiO x-based RRAM.
- To determine the optimal reset pulse width for achieving linear and reliable multilevel programming.
- To analyze the impact of pulse width on cycle-to-cycle variation.
Main Methods:
- Fabrication of Al2O3/TiO x RRAM devices in a 32x32 cross-point array.
- Utilizing incremental step pulse programming (ISPP) with varying reset pulse widths (100 µs to 100 ns).
- Monitoring programming characteristics and read current to assess conductance tuning and variation.
Main Results:
- Longer reset pulse widths (100 µs) resulted in abrupt current jumps exceeding programming targets.
- Shorter reset pulse widths (100 ns) enabled gradual current increase and precise conductance tuning.
- Reducing reset pulse width decreased cycle-to-cycle variation by over 50%.
Conclusions:
- Reset pulse width is a critical parameter for controlling multilevel programming in Al2O3/TiO x RRAM.
- Narrower reset pulses facilitate uniform filament disruption and regrowth, enhancing reliability.
- Optimizing reset pulse width provides a direct pathway to linear and stable multilevel RRAM operation.
Related Concept Videos
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
Non-ohmic Devices
Consider a simple circuit consisting of a battery, a diode, and a resistor. A...
MOSFET: Depletion Mode
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...

