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Published on: November 22, 2019
Ultrahigh Transmittance Biomimetic Fused Quartz Windows Enabled by Frequency-Doubling Femtosecond Laser Processing
Zheng Gao1, Cong Wang1, Xianshi Jia1
1State Key Laboratory of Precision Manufacturing for Extreme Service Performance, College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China.
Researchers developed advanced antireflective subwavelength structures (ASS) using a 515 nm femtosecond laser. This method significantly enhances infrared window transmittance to 99% and improves durability, overcoming previous fabrication challenges.
Area of Science:
- Materials Science
- Optics
- Nanotechnology
Background:
- Fabricating antireflective subwavelength structures (ASS) on fused silica (SiO2) with femtosecond lasers is challenging due to parameter complexity and precision demands.
- Hole-type microstructures show superior potential for enhancing infrared window transmittance compared to other ASS designs.
Purpose of the Study:
- To investigate and optimize the fabrication of hole-type ASS on fused silica using femtosecond laser processing.
- To evaluate the impact of laser wavelength on ASS performance and durability for ultrahigh-transmittance applications.
Main Methods:
- Analysis of two representative ASS types to identify hole-type microstructures for infrared applications.
- Development of a dual-pulse femtosecond laser setup (1030 nm) and subsequent modification to 515 nm using a frequency-doubling crystal for finer microstructure fabrication.
- Characterization of ASS performance, including transmittance (up to 99% at 2.5 μm), water contact angle, surface roughness, and abrasion resistance.
Main Results:
- Hole-type microstructures fabricated with a 515 nm femtosecond laser achieved 99% transmittance at 2.5 μm.
- ASS produced at 515 nm demonstrated superior antireflective performance compared to other wavelengths.
- The fabricated ASS exhibited excellent stability and durability, maintaining high transmittance after abrasion testing and under various conditions.
Conclusions:
- Femtosecond laser processing at 515 nm is an effective method for fabricating high-performance antireflective subwavelength structures on fused silica.
- The developed hole-type ASS offer ultrahigh transmittance and robust durability for infrared window applications.
- This technique overcomes previous fabrication limitations, paving the way for advanced optical coatings.
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