Localized Electric Field Tailoring to Balance Voltage Reliability, Current Density, and High-Frequency Performance of...

Emerging applications including advanced industrial manufacturing, cutting-edge scientific research and medical equipment demand AlGaN/GaN HEMTs possessing both high-frequency and high-voltage characteristics. However, a persistent trade-off remains between the frequency characteristics and breakdown characteristics of these devices. In this study, we employed localized electric field tailoring (LEFT) by introducing materials with different dielectric constants to construct a non-uniform composite gate dielectric layer, aiming to balance the breakdown voltage and cut-off frequency of the device. Device models were developed using APSYS-2018 software and their reliability was experimentally validated. Research data indicates that, compared to traditional uniform high-k (typically with dielectric constants k > 10, such as HfO₂ and HfZrO) gate dielectrics, the non-uniform composite gate dielectric structure demonstrates superior transconductance, saturation current density and cut-off frequency, with minimal degradation in breakdown voltage. Specifically, relative to HfO₂ and HfZrO uniform devices, the Al₂O₃/HfO₂ and Al₂O₃/HfZrO non-uniform HEMTs achieved 20.0% and 35.2% increases in cut-off frequency, respectively. Meanwhile, breakdown voltage remained above 97% of their uniform counterparts, saturation current density and transconductance increased by approximately 5%. Therefore, this non-uniform composite gate dielectric layer structure of AlGaN/GaN HEMT with LEFT holds great potential for industrial plasma generators, magnetic resonance imaging systems and biomedical radiofrequency hyperthermia devices.