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Updated: May 5, 2026

Characterization of SiN Integrated Optical Phased Arrays on a Wafer-Scale Test Station
Published on: April 1, 2020
Low-loss, low-power, MOSCAP optical phase shifter on an InP membrane platform
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We demonstrate a low-loss and low-power InP MOSCAP optical phase shifter. The device features a MOSCAP structure formed by placing a metal electrode on top of an InP membrane waveguide, separated by a 700-nm-thick gate oxide. Voltage application induces electron accumulation at the surface of the InP waveguide, modulating the refractive index. By exploiting the large electron-induced refractive index change and the low free carrier absorption in InP, a modulation efficiency (Vπ·L) of 1.08 V·cm and an additional optical loss of 0.27 dB/π are obtained, despite the use of the thick gate oxide. Furthermore, the thick gate oxide suppresses leakage current, enabling low power operation of 11.5 pW/π.

