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Vapor Pressure Lowering

The equilibrium vapor pressure of a liquid is the pressure exerted by its gaseous phase when vaporization and condensation are occurring at equal rates: Dissolving a nonvolatile substance in volatile liquid results in a lowering of the liquid’s vapor pressure. This phenomenon can be explained by considering the effect of added solute molecules on the liquid's vaporization and condensation processes. To vaporize, solvent molecules must be present at the surface of the solution. The presence of...
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Split Point Analysis and Uncertainty Quantification of Thermal-Optical Organic/Elemental Carbon Measurements
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Primary Humidity Standards for Trace Water Measurements in Ultra-High-Purity Process Gases.

Vito Fernicola1, Giulio Beltramino1, Antonio Castrillo2

  • 1INRIM Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce 91, 10135 Torino, Italy.

Sensors (Basel, Switzerland)
|July 15, 2026
PubMed
Summary

Accurate measurement of trace water in ultra-high-purity (UHP) gases is crucial for industries like semiconductor manufacturing. New traceable measurement methods and standards now cover a wide range with improved uncertainty, ensuring quality control.

Keywords:
frost-point temperaturespectroscopic analyzerstrace humidity standardstrace water measurementultra-high-purity gaseswater vapor amount fraction

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Published on: March 9, 2018

Area of Science:

  • Metrology
  • Analytical Chemistry
  • Materials Science

Background:

  • Trace water is a critical contaminant in ultra-high-purity (UHP) process gases, impacting product quality in advanced technology sectors.
  • Existing methods for measuring trace water in UHP gases face limitations in range and accuracy, particularly for diverse industrial matrices.
  • The semiconductor industry relies heavily on UHP gases, making precise water content monitoring essential for manufacturing yields.

Purpose of the Study:

  • To develop and improve traceable measurement methods and standards for trace water in UHP process gases.
  • To extend the measurement range and enhance the uncertainty of water vapor quantification in gases like Argon (Ar) and Nitrogen (N2).
  • To establish a metrological infrastructure supporting the calibration needs of the gas and semiconductor industries.

Main Methods:

  • Development of traceable measurement methods and standards within the 5 nmol·mol⁻¹ to 5 µmol·mol⁻¹ range.
  • Utilized a comb-assisted cavity ring-down spectroscopy (CRDS) system for high-sensitivity detection.
  • Validated measurement capabilities through applications relevant to process instrumentation and the gas industry.

Main Results:

  • Achieved combined standard uncertainties from approximately 0.4% to 1.5% for water vapor amount fraction.
  • Frost-point temperature uncertainties were improved, ranging from 0.03 °C to 0.07 °C.
  • The comb-assisted CRDS system demonstrated detection limits in the sub-ppb to ppt range.

Conclusions:

  • The PROMETH2O project successfully enhanced metrology for trace water in UHP gases, meeting industry demands.
  • A distributed metrological infrastructure now offers SI-traceable measurements, bolstering calibration capabilities.
  • These advancements significantly support the quality control and manufacturing processes in the gas and semiconductor sectors.