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Nature Communications|January 5, 2017
Investigation of phonon coherence and backscattering using silicon nanomeshesJaeho Lee, Woochul Lee, Geoff Wehmeyer, et al.Langmuir : the ACS Journal of Surfaces and Colloids|February 9, 2005
Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithographyGun-Young Jung, Zhiyong Li, Wei Wu, et al.ACS Nano|October 15, 2011
Sub-10 nm nanofabrication via nanoimprint directed self-assembly of block copolymersSang-Min Park, Xiaogan Liang, Bruce D Harteneck, et al.Langmuir : the ACS Journal of Surfaces and Colloids|June 29, 2005
Improved pattern transfer in nanoimprint lithography at 30 nm half-pitch by substrate-surface functionalizationGun-Young Jung, Zhiyong Li, Wei Wu, et al.Optics Letters|November 1, 2003
20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected]Weilun Chao, Erik Anderson, Gregory P Denbeaux, et al.Nanoscale|September 14, 2020
Selectively accessing the hotspots of optical nanoantennas by self-aligned dry laser ablationChristian Schäfer, Pradeep N Perera, Florian Laible, et al.Journal of the American Chemical Society|February 17, 2011
Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithographyVincent S D Voet, Teresa E Pick, Sang-Min Park, et al.The Journal of Chemical Physics|October 22, 2018
Fundamental understanding of chemical processes in extreme ultraviolet resist materialsOleg Kostko, Bo Xu, Musahid Ahmed, et al.Pageof 2