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Optics Express|January 7, 2010
A single W/B4C transmission multilayer for polarization analysis of soft x-rays up to 1keVMichael A MacDonald, Franz Schäfers, Andreas GauppApplied Optics|January 21, 2006
Interface engineered ultrashort period Cr-Ti multilayers as high reflectance mirrors and polarizers for soft x rays of lambda = 2.74 nm wavelengthNaureen Ghafoor, Per O A Persson, Jens Birch, et al.Optics Express|August 10, 2017
Impact of B<sub>4</sub>C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrorsNaureen Ghafoor, Fredrik Eriksson, Andrew Aquila, et al.Applied Optics|August 12, 2008
Atomic scale interface engineering by modulated ion-assisted deposition applied to soft x-ray multilayer opticsFredrik Eriksson, Naureen Ghafoor, Franz Schäfers, et al.The Review of Scientific Instruments|July 8, 2008
Transmissive x-ray beam position monitors with submicron position- and submillisecond time resolutionMartin R Fuchs, Karsten Holldack, Mark Bullough, et al.Science and Technology of Advanced Materials|November 24, 2016
Soft x-ray reflectometry, hard x-ray photoelectron spectroscopy and transmission electron microscopy investigations of the internal structure of TiO<sub>2</sub>(Ti)/SiO<sub>2</sub>/Si stacksElena O Filatova, Igor V Kozhevnikov, Andrey A Sokolov, et al.Journal of Synchrotron Radiation|December 24, 2019
Optical constants of sputtered beryllium thin films determined from photoabsorption measurements in the spectral range 20.4-250 eVMikhail Svechnikov, Nikolay Chkhalo, Alexey Lopatin, et al.Optics Letters|January 16, 2019
Stable high-reflection Be/Mg multilayer mirrors for solar astronomy at 30.4 nmVladimir N Polkovnikov, Nikolai I Chkhalo, Roman S Pleshkov, et al.Optics Letters|December 15, 2017
High-reflection Mo/Be/Si multilayers for EUV lithographyNikolai I Chkhalo, Sergei A Gusev, Andrey N Nechay, et al.Journal of Synchrotron Radiation|September 7, 2019
Soft X-ray varied-line-spacing gratings fabricated by near-field holography using an electron beam lithography-written phase maskDakui Lin, Zhengkun Liu, Kay Dietrich, et al.Pageof 2