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Fred Roozeboom

Showing results (1-10 of 9) with videos related to

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Advanced Materials (Deerfield Beach, Fla.)|April 12, 2023
High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO<sub>2</sub> with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low DefectivityBora Karasulu, Fred Roozeboom, Alfredo Mameli
Microsystems & Nanoengineering|May 7, 2019
Precision in harsh environmentsPaddy French, Gijs Krijnen, Fred Roozeboom
Advanced Materials (Deerfield Beach, Fla.)|July 29, 2010
High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivationPaul Poodt, Adriaan Lankhorst, Fred Roozeboom, et al.
Membranes|March 26, 2025
Ceramic Nanofiltration Membranes: Creating Nanopores by Calcination of Atmospheric-Pressure Molecular Layer Deposition Grown Titanicone LayersHarpreet Sondhi, Mingliang Chen, Michiel Pieter Nijboer, et al.
ACS Nano|August 30, 2017
Area-Selective Atomic Layer Deposition of SiO<sub>2</sub> Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type CycleAlfredo Mameli, Marc J M Merkx, Bora Karasulu, et al.
ACS Applied Materials & Interfaces|December 16, 2016
Atomic Layer Deposition of In<sub>2</sub>O<sub>3</sub>:H from InCp and H<sub>2</sub>O/O<sub>2</sub>: Microstructure and Isotope Labeling StudiesYizhi Wu, Bart Macco, Dries Vanhemel, et al.
Chemistry of Materials : a Publication of the American Chemical Society|March 9, 2018
Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe TomographyYizhi Wu, A Devin Giddings, Marcel A Verheijen, et al.
Chemistry of Materials : a Publication of the American Chemical Society|April 14, 2017
Area-Selective Atomic Layer Deposition of In<sub>2</sub>O<sub>3</sub>:H Using a μ-Plasma Printer for Local Area ActivationAlfredo Mameli, Yinghuan Kuang, Morteza Aghaee, et al.
ACS Applied Materials & Interfaces|March 5, 2024
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO<sub>2</sub> and TiON on SiN vs SiO<sub>2</sub>Alfredo Mameli, Kanda Tapily, Jie Shen, et al.
Pageof 1

Showing results (1-10 of 9) with videos related to

Sort By:
Pageof 1
Advanced Materials (Deerfield Beach, Fla.)|April 12, 2023
High-Throughput Area-Selective Spatial Atomic Layer Deposition of SiO<sub>2</sub> with Interleaved Small Molecule Inhibitors and Integrated Back-Etch Correction for Low DefectivityBora Karasulu, Fred Roozeboom, Alfredo Mameli
Microsystems & Nanoengineering|May 7, 2019
Precision in harsh environmentsPaddy French, Gijs Krijnen, Fred Roozeboom
Advanced Materials (Deerfield Beach, Fla.)|July 29, 2010
High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivationPaul Poodt, Adriaan Lankhorst, Fred Roozeboom, et al.
Membranes|March 26, 2025
Ceramic Nanofiltration Membranes: Creating Nanopores by Calcination of Atmospheric-Pressure Molecular Layer Deposition Grown Titanicone LayersHarpreet Sondhi, Mingliang Chen, Michiel Pieter Nijboer, et al.
ACS Nano|August 30, 2017
Area-Selective Atomic Layer Deposition of SiO<sub>2</sub> Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type CycleAlfredo Mameli, Marc J M Merkx, Bora Karasulu, et al.
ACS Applied Materials & Interfaces|December 16, 2016
Atomic Layer Deposition of In<sub>2</sub>O<sub>3</sub>:H from InCp and H<sub>2</sub>O/O<sub>2</sub>: Microstructure and Isotope Labeling StudiesYizhi Wu, Bart Macco, Dries Vanhemel, et al.
Chemistry of Materials : a Publication of the American Chemical Society|March 9, 2018
Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe TomographyYizhi Wu, A Devin Giddings, Marcel A Verheijen, et al.
Chemistry of Materials : a Publication of the American Chemical Society|April 14, 2017
Area-Selective Atomic Layer Deposition of In<sub>2</sub>O<sub>3</sub>:H Using a μ-Plasma Printer for Local Area ActivationAlfredo Mameli, Yinghuan Kuang, Morteza Aghaee, et al.
ACS Applied Materials & Interfaces|March 5, 2024
Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO<sub>2</sub> and TiON on SiN vs SiO<sub>2</sub>Alfredo Mameli, Kanda Tapily, Jie Shen, et al.
Pageof 1