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ACS Applied Materials & Interfaces
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February 21, 2024
Comment on "Bipolar Resistive Switching in Lanthanum Titanium Oxide and an Increased On/Off Ratio Using an Oxygen-Deficient ZnO Interlayer"
Hei Wong
Nanomaterials (Basel, Switzerland)
|
December 11, 2022
Abridging CMOS Technology
Hei Wong
ACS Nano
|
March 18, 2025
Comment on "Submicron Memtransistors Made from Monocrystalline Molybdenum Disulfide"
Hei Wong
Nanomaterials (Basel, Switzerland)
|
June 13, 2024
Abridging the CMOS Technology II
Hei Wong
Nanomaterials (Basel, Switzerland)
|
May 28, 2022
On the Vertically Stacked Gate-All-Around Nanosheet and Nanowire Transistor Scaling beyond the 5 nm Technology Node
Hei Wong, Kuniyuki Kakushima
Nanomaterials (Basel, Switzerland)
|
February 11, 2023
Poole-Frenkel (PF)-MOS: A Proposal for the Ultimate Scale of an MOS Transistor
Hei Wong, Kuniyuki Kakushima
Journal of Nanoscience and Nanotechnology
|
May 16, 2009
Probability current and antiresonances of particle tunneling through biased heterostructures
V Filip, D Nicolaescu, Hei Wong
Nanomaterials (Basel, Switzerland)
|
February 23, 2024
Contacts at the Nanoscale and for Nanomaterials
Hei Wong, Jieqiong Zhang, Jun Liu
Journal of Nanoscience and Nanotechnology
|
May 16, 2009
Photoluminescence of silicon nanocrystals embedded in silicon oxide
C K Wong, Hei Wong, V Filip
Nanomaterials (Basel, Switzerland)
|
August 27, 2021
Characteristic Variabilities of Subnanometer EOT La<sub>2</sub>O<sub>3</sub> Gate Dielectric Film of Nano CMOS Devices
Hei Wong, Jieqiong Zhang, Hiroshi Iwai, et al.
Page
of 18
Search research articles
Search
Showing results (1-10 of 171) with videos related to
Sort By:
Page
of 18
ACS Applied Materials & Interfaces
|
February 21, 2024
Comment on "Bipolar Resistive Switching in Lanthanum Titanium Oxide and an Increased On/Off Ratio Using an Oxygen-Deficient ZnO Interlayer"
Hei Wong
Nanomaterials (Basel, Switzerland)
|
December 11, 2022
Abridging CMOS Technology
Hei Wong
ACS Nano
|
March 18, 2025
Comment on "Submicron Memtransistors Made from Monocrystalline Molybdenum Disulfide"
Hei Wong
Nanomaterials (Basel, Switzerland)
|
June 13, 2024
Abridging the CMOS Technology II
Hei Wong
Nanomaterials (Basel, Switzerland)
|
May 28, 2022
On the Vertically Stacked Gate-All-Around Nanosheet and Nanowire Transistor Scaling beyond the 5 nm Technology Node
Hei Wong, Kuniyuki Kakushima
Nanomaterials (Basel, Switzerland)
|
February 11, 2023
Poole-Frenkel (PF)-MOS: A Proposal for the Ultimate Scale of an MOS Transistor
Hei Wong, Kuniyuki Kakushima
Journal of Nanoscience and Nanotechnology
|
May 16, 2009
Probability current and antiresonances of particle tunneling through biased heterostructures
V Filip, D Nicolaescu, Hei Wong
Nanomaterials (Basel, Switzerland)
|
February 23, 2024
Contacts at the Nanoscale and for Nanomaterials
Hei Wong, Jieqiong Zhang, Jun Liu
Journal of Nanoscience and Nanotechnology
|
May 16, 2009
Photoluminescence of silicon nanocrystals embedded in silicon oxide
C K Wong, Hei Wong, V Filip
Nanomaterials (Basel, Switzerland)
|
August 27, 2021
Characteristic Variabilities of Subnanometer EOT La<sub>2</sub>O<sub>3</sub> Gate Dielectric Film of Nano CMOS Devices
Hei Wong, Jieqiong Zhang, Hiroshi Iwai, et al.
Page
of 18