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Applied Optics|August 14, 2013
Accurate position measurement of a high-density beam spot array in digital maskless lithographyDong Won Kang, Minwook Kang, Jae W HahnNanotechnology|March 21, 2013
Imaging heterogeneous nanostructures with a plasmonic resonant ridge apertureTaekyong Lee, Eungman Lee, Seonghyeon Oh, et al.Scientific Reports|August 31, 2017
Nanoscale 2.5-dimensional surface patterning with plasmonic lithographyHowon Jung, Changhoon Park, Seonghyeon Oh, et al.Nanotechnology|December 6, 2017
Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulationSeonghyeon Oh, Dandan Han, Hyeon Bo Shim, et al.Advanced Materials (Deerfield Beach, Fla.)|October 9, 2012
Resolution limit in plasmonic lithography for practical applications beyond 2x-nm half pitchSeok Kim, Howon Jung, Yongwoo Kim, et al.Optics Express|December 10, 2009
Plasmonic nano lithography with a high scan speed contact probeYongwoo Kim, Seok Kim, Howon Jung, et al.Optics Letters|April 1, 2017
Pseudo actinometry for the measurement of reactive species densityMinwook Kang, Yunhyeok Ko, Il-Yong Jang, et al.Optics Express|October 15, 2011
Accurate near-field lithography modeling and quantitative mapping of the near-field distribution of a plasmonic nanoaperture in a metalYongwoo Kim, Howon Jung, Seok Kim, et al.The Review of Scientific Instruments|November 2, 2010
Spatially resolvable optical emission spectrometer for analyzing density uniformity of semiconductor process plasmaChanghoon Oh, Hoonchul Ryoo, Hyungwoo Lee, et al.Pageof 2